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Model of secondary electron emission at high incident electron energy for metal EI SCIE Scopus CSCD PKU
期刊论文 | 2013 , 62 (8) | ACTA PHYSICA SINICA | IF: 0.845
WoS CC Cited Count: 4
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Abstract :

The models of the true secondary electron emission and backscattered electron emission for metal are provided, based on the physical process of secondary electron emission from metal at high incident electron energy. The formula for the true secondary electron yield at high incident electron energy is derived with the Bethe equation known to provide accurate and simple analytical expressions for the stopping power and the probability that a secondary electron produced in a material reaches the surface and is emitted into the vacuum. The formula for the backscattered electron yield at high incident electron energy is derived with the absorbing rule for the incident electron in the material. All the above results lead to a new model for secondary electron emission from metal at high incident electron energy. The secondary electron yields of Au, Ag, Cu and Al derived with the new model are in good agreement with the results obtained from the scatters process simulation code-Casino.

Keyword :

secondary electron emission high incident electron energy scatters process metal surface

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GB/T 7714 Yang Wen-Jin , Li Yong-Dong , Liu Chun-Liang . Model of secondary electron emission at high incident electron energy for metal [J]. | ACTA PHYSICA SINICA , 2013 , 62 (8) .
MLA Yang Wen-Jin 等. "Model of secondary electron emission at high incident electron energy for metal" . | ACTA PHYSICA SINICA 62 . 8 (2013) .
APA Yang Wen-Jin , Li Yong-Dong , Liu Chun-Liang . Model of secondary electron emission at high incident electron energy for metal . | ACTA PHYSICA SINICA , 2013 , 62 (8) .
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Researches on Preparation Methods for Surface-conduction Electron-emitter Display CPCI-S
会议论文 | 2011 , 250-255 | Conference of China Display / Asia Display 2011
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Abstract :

A This paper introduced cathode and anode substrate preparation methods and detailed vacuum sealing technology for surface-conduction electron-emitter display (SED). After exhausting to a high vacuum, the cathode substrate of the sealed device experienced an electroforming process to form nanogaps acted as electron emission sources, then we tested the light-emitting situation of the device and obtained relatively uniform light-emitting arrays.

Keyword :

Surface-conduction electron-emitter display Anode substrate Vacuum sealing Cathode substrate

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GB/T 7714 Liu Ting , Zhou Zi-yun , Wu Sheng-li et al. Researches on Preparation Methods for Surface-conduction Electron-emitter Display [C] . 2011 : 250-255 .
MLA Liu Ting et al. "Researches on Preparation Methods for Surface-conduction Electron-emitter Display" . (2011) : 250-255 .
APA Liu Ting , Zhou Zi-yun , Wu Sheng-li , Hu Wen-bo . Researches on Preparation Methods for Surface-conduction Electron-emitter Display . (2011) : 250-255 .
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