The　surface　morphology　evolution　and　phase　structures　of　Cu-W　thin　films　with　annealing　temperatures　were　investigated.　The　results　indicate　the　overall　agglomeration　process　of　Cu-W　thin　films　takes　place　in　two　distinct　stages:　nucleation　at　pores　and　growth　of　islands.　Fractal　dimension　can　describe　the　rough　surface　morphology　in　a　quantitative　way.　A　new　and　straight　method　integrating　discrete　wavelet　transform　and　fractal　geometry　is　presented　for　analyzing　the　anisotropy　of　surface　structure　of　Cu-W　thin　films.　Furthermore　the　relationship　between　multi-scale　property　of　surface　morphology　of　Cu-　W　thin　films　and　phase　structure　transition　is　constructed　by　using　it.　It　can　be　concluded　that　the　trend　of　surface　structure　anisotropy　with　annealing　temperatures　is　sensitive　to　the　variation　of　phase　structures.