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Author:

He, Jinqiang (He, Jinqiang.) | Wang, Hui (Wang, Hui.) | Lin, Chunjiang (Lin, Chunjiang.) | Lin, Jiajun (Lin, Jiajun.) | Li, Shengtao (Li, Shengtao.) (Scholars:李盛涛)

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CPCI-S EI Scopus

Abstract:

CaCu3Ti4O12 (CCTO) ceramics as a dielectric material are of potential applications in capacitors and memory devices, however, how to further improve the dielectric properties of CCTO ceramics is still a challenge. The dielectric behavior of this material can be manipulated via the modification in composition, and Si as a glass phase should have an impact on the properties of CCTO ceramics, this work investigated the effects of Si-doping on CaCu3Ti4O12 with the aim of improving dielectric characteristics. CaCu3Ti4O12 ceramics of various Si-doping concentrations were synthesized by solid state reaction method at 1050 degrees C. The microstructure and the dielectric properties of Si-doped and undoped CaCu3Ti4O12 were studied. It is found that the added silicon can be incorporated into the structure of CaCu3Ti4O12, a certain amount of Si-doping would facilitate the grain growth, promote the precipitation of intergranular phase, and improve the compactness and homogeneity of CaCu3Ti4O12 ceramics. Si-doped CaCu3Ti4O12 samples show significantly higher dielectric constant, accompanied by larger dielectric loss. The temperature dependence of dielectric permittivity epsilon '' for various frequencies shows three successive sets of peaks attributed to intrinsic relaxation polarization processes, suggesting that Si-doping has little influence on the relaxation mechanism of CaCu3Ti4O12 ceramics.

Keyword:

CaCu3Ti4O12 dielectric properties Si-doping

Author Community:

  • [ 1 ] [He, Jinqiang; Wang, Hui; Lin, Chunjiang; Lin, Jiajun; Li, Shengtao] Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China

Reprint Author's Address:

  • Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China.

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Source :

2013 IEEE CONFERENCE ON ELECTRICAL INSULATION AND DIELECTRIC PHENOMENA (CEIDP)

ISSN: 0084-9162

Year: 2013

Page: 599-602

Language: English

Cited Count:

WoS CC Cited Count: 2

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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