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Author:

Wang, Lu (Wang, Lu.) | Ye, Ming (Ye, Ming.) | He, Yongning (He, Yongning.)

Indexed by:

CPCI-S Scopus EI

Abstract:

This paper presents a complementary split ring resonator (CSRR) based sensor for non-contact sheet resistance characterization of conductive nanometric films. Through fullwave simulations, we observed the dependence of Q-factor of CSRR on sheet resistance of conductive film which is placed on top of the CSRR. Results show that the Q-factor of the CSRR decreases monotonously with increasing sheet resistance. Experiments were performed with a CSRR resonating at around 1.9 GHz. Silver films, with sheet resistance ranging from similar to 0.1 Ohm/sq to similar to 1 Ohm/sq, were sputtered on 1.1 mm thick glass. Sheet resistances of these silver films were measured using standard four-point probe test. Experimental results agree qualitatively well with simulations and quantitatively match with the proposed fitting formulas describing relationship between Qfactor and sheet resistance. Therefore, it is possible to obtain sheet resistance from measured Q-factor along with the fitting formula. The proposed sensor is low cost and non-contact, which may be applied to applications relating to conductive thin film characterizations.

Keyword:

Conductive nanometric film CSRR Q-factor RF sensor sheet resistance

Author Community:

  • [ 1 ] [Wang, Lu; Ye, Ming; He, Yongning] Xi An Jiao Tong Univ, Sch Microelect, Xian, Shaanxi, Peoples R China
  • [ 2 ] [Ye, Ming] State Key Lab Millimeter Waves, Nanjing, Jiangsu, Peoples R China
  • [ 3 ] [Wang, Lu]Xi An Jiao Tong Univ, Sch Microelect, Xian, Shaanxi, Peoples R China
  • [ 4 ] [Ye, Ming]Xi An Jiao Tong Univ, Sch Microelect, Xian, Shaanxi, Peoples R China
  • [ 5 ] [He, Yongning]Xi An Jiao Tong Univ, Sch Microelect, Xian, Shaanxi, Peoples R China
  • [ 6 ] [Ye, Ming]State Key Lab Millimeter Waves, Nanjing, Jiangsu, Peoples R China

Reprint Author's Address:

  • Xi An Jiao Tong Univ, Sch Microelect, Xian, Shaanxi, Peoples R China.; Ye, M (reprint author), State Key Lab Millimeter Waves, Nanjing, Jiangsu, Peoples R China.

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Source :

2017 IEEE MTT-S INTERNATIONAL MICROWAVE WORKSHOP SERIES ON ADVANCED MATERIALS AND PROCESSES FOR RF AND THZ APPLICATIONS (IMWS-AMP)

ISSN: 9781538604809

Year: 2017

Page: 1-3

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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