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Author:

Lu, Xinru (Lu, Xinru.) | Chen, Juan (Chen, Juan.) | Huang, Youqi (Huang, Youqi.) | Wu, Zixian (Wu, Zixian.) | Zhang, Anxue (Zhang, Anxue.)

Indexed by:

SCIE EI Scopus

Abstract:

Researching and developing of ultra-wideband capability and high light transmittance have been hot issues in the field of new artificial electromagnetic stealth material. In this paper, a novel transparent metamaterial absorber, made of resistive films and glass, has been presented. The simulation results show that, under the incidence of plane wave, the absorber realizes high absorption during frequency range from 3.5 GHz to 18.5 GHz while keeping insensitive to polarization. A prototype has been fabricated and tested, and the measurement results are in good consistent with simulation. Along with its high transmittance and superior absorption, we expect that the absorber has great potential applications in RCS (Radar Cross Section) reduction and electromagnetic shielding.

Keyword:

Absorber broadband RCS reduction resistive film transparent

Author Community:

  • [ 1 ] [Lu, Xinru; Wu, Zixian; Zhang, Anxue] Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710000, Shaanxi, Peoples R China
  • [ 2 ] [Chen, Juan] Xi An Jiao Tong Univ, Shenzhen Res Sch, Shenzhen 518000, Peoples R China
  • [ 3 ] [Huang, Youqi] China Bldg Mat Acad Co Ltd, Beijing 100024, Peoples R China
  • [ 4 ] [Lu, Xinru]Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710000, Shaanxi, Peoples R China
  • [ 5 ] [Wu, Zixian]Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710000, Shaanxi, Peoples R China
  • [ 6 ] [Zhang, Anxue]Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710000, Shaanxi, Peoples R China
  • [ 7 ] [Chen, Juan]Xi An Jiao Tong Univ, Shenzhen Res Sch, Shenzhen 518000, Peoples R China
  • [ 8 ] [Huang, Youqi]China Bldg Mat Acad Co Ltd, Beijing 100024, Peoples R China

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Source :

APPLIED COMPUTATIONAL ELECTROMAGNETICS SOCIETY JOURNAL

ISSN: 1054-4887

Year: 2019

Issue: 5

Volume: 34

Page: 765-770

0 . 6 8

JCR@2019

0 . 7 2 4

JCR@2020

ESI Discipline: ENGINEERING;

ESI HC Threshold:83

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 1

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 10

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