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Author:

Wang, Shuang (Wang, Shuang.) | Mao, Jiale (Mao, Jiale.) | Zhang, Lei (Zhang, Lei.) | Zheng, Yiting (Zheng, Yiting.) | Cheng, Yonghong (Cheng, Yonghong.)

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Abstract:

Low dielectric constant materials are appropriate solutions to address the propagation delay problem in ultra-large scale integrated circuits. Herein, adamantane is applied to improve the dielectric properties of polybenzoxazines. Monomers synthesized from bisphenol-A, 4,4'-diphenol and 1-amino adamantane are developed for understanding the properties of polybenzoxazines at molecular level. We found that incorporating adamantane results in much lower dielectric constant and loss factor without sacrificing the glass transition temperature and thermal stability, which are potential alternates as new dielectric interlayer materials.

Keyword:

adamantane Chemicals dielectric constant Dielectric constant Heating systems Plastics polybenzoxazine Polymers structure-property relationship Temperature measurement

Author Community:

  • [ 1 ] [Wang, Shuang]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
  • [ 2 ] [Mao, Jiale]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
  • [ 3 ] [Zhang, Lei]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
  • [ 4 ] [Cheng, Yonghong]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
  • [ 5 ] [Zhang, Lei]Zhejiang Sci Tech Univ, Sch Mat Sci & Engn, Hangzhou 310018, Peoples R China
  • [ 6 ] [Zheng, Yiting]Hong Kong Univ Sci & Technol, Dept Mech & Aerosp Engn, Kowloon, Hong Kong, Peoples R China

Reprint Author's Address:

  • [Wang, Shuang]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China;;

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Source :

IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION

ISSN: 1070-9878

Year: 2020

Issue: 3

Volume: 27

Page: 714-721

2 . 9 3 1

JCR@2020

2 . 9 3 1

JCR@2020

ESI Discipline: ENGINEERING;

ESI HC Threshold:59

JCR Journal Grade:2

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 2

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

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