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Author:

Liu, Jiang (Liu, Jiang.) | Yang, Mingchao (Yang, Mingchao.) | Liu, Cheng (Liu, Cheng.) | Liu, Weihua (Liu, Weihua.) | Han, Chuanyu (Han, Chuanyu.) | Zhang, Yong (Zhang, Yong.) | Geng, Li (Geng, Li.) | Hao, Yue (Hao, Yue.)

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Abstract:

Surface treatment is quite vital to reduce the reverse leakage current and improve the current On-Off ratio of gallium nitride (GaN) quasi-vertical Schottky barrier diode (SBD). In this work, we report a new nondestructive low temperature supercritical CO2 fluid (SCF) nitridation technology to treat the surface of GaN and substantially reduce the leakage current of GaN quasi-vertical SBD. The X-ray photoelectron spectroscopy (XPS) reveals the increased nitriding degree and oxygen doping degree in the form of GaOx after the SCF process results in the leakage performance improvement. As a result, the defects at metal/semiconductor interface are passivated. Also, because of NH-2 and OH- generated from the SCF process, the surface peak electric field of n-GaN decreases, and thus the breakdown voltage is enhanced. The reverse leakage current density is reduced by more than three orders of magnitude from 3.7 × 10-6 to 3.52 × 10-9 A/cm2 (at -3 V) and the ON-/ OFF-current ratio is improved by three orders from 8 × 107 to 5.74 × 1010. © 2020 IEEE.

Keyword:

Aluminum nitride Electric fields Gallium nitride III-V semiconductors Leakage currents Nitriding Schottky barrier diodes Surface treatment Temperature X ray photoelectron spectroscopy

Author Community:

  • [ 1 ] [Liu, Jiang]School of Microelectronics, Xi'an Jiaotong University, Xi'an; 710049, China
  • [ 2 ] [Yang, Mingchao]School of Microelectronics, Xi'an Jiaotong University, Xi'an; 710049, China
  • [ 3 ] [Liu, Cheng]School of Microelectronics, Xi'an Jiaotong University, Xi'an; 710049, China
  • [ 4 ] [Liu, Weihua]School of Microelectronics, Xi'an Jiaotong University, Xi'an; 710049, China
  • [ 5 ] [Han, Chuanyu]School of Microelectronics, Xi'an Jiaotong University, Xi'an; 710049, China
  • [ 6 ] [Zhang, Yong]School of Microelectronics, Xi'an Jiaotong University, Xi'an; 710049, China
  • [ 7 ] [Geng, Li]School of Microelectronics, Xi'an Jiaotong University, Xi'an; 710049, China
  • [ 8 ] [Hao, Yue]School of Microelectronics, Xidian University, Xi'an; 710071, China

Reprint Author's Address:

  • [Geng, Li]School of Microelectronics, Xi'an Jiaotong University, Xi'an; 710049, China;;

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Source :

IEEE Transactions on Electron Devices

ISSN: 0018-9383

Year: 2021

Issue: 1

Volume: 68

Page: 197-201

2 . 9 1 7

JCR@2020

ESI Discipline: ENGINEERING;

ESI HC Threshold:30

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 3

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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