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Author:

Liu, Jianmei (Liu, Jianmei.) | Jacob, Lilit (Jacob, Lilit.) | Langley, Julien (Langley, Julien.) | Fu, Zhenxiao (Fu, Zhenxiao.) | Cao, Xiuhua (Cao, Xiuhua.) | Ta, Shiwo (Ta, Shiwo.) | Chen, Hua (Chen, Hua.) | Svirskas, ar Nas (Svirskas, ar Nas.) | Banys, J Ras (Banys, J Ras.) | Wei, Xiaoyong (Wei, Xiaoyong.) | Cox, Nicholas (Cox, Nicholas.) | Frankcombe, Terry J (Frankcombe, Terry J.) | Liu, Yun (Liu, Yun.)

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Abstract:

Microwave dielectric materials are of great interest due to their applications in communication technology. The intrinsically low dielectric permittivity (generally less than 100) of traditional microwave dielectric materials has limited their capability in reducing the device size and developing various applications. In this paper, we report a microwave dielectric material, (La + Nb) co-doped BaSnO3, which exhibits both frequency- and temperature-independent colossal permittivity ( > 103) over the frequency range from 10 Hz to microwave region (∼1 GHz) while retaining the ultra-low dielectric loss of 4 × 10-4, equivalent to a quality factor Qf (GHz) ∼2500. Systemic defect analysis and density functional theory calculations suggest that negatively charged La and positively charged Nb octahedra are correlated adjacent to each other along the [110] direction, forming defect-dipole clusters, which lead to their microwave dielectric properties. This work presents insights on the development of microwave dielectric materials that offer many potentials for microwave dielectric devices and their associated applications in future communication technology. © 2021 American Chemical Society.

Keyword:

Barium compounds Cobalt compounds Defects Density functional theory Dielectric devices Dielectric losses Dielectric materials Microwaves Permittivity Tin compounds

Author Community:

  • [ 1 ] [Liu, Jianmei]Research School of Chemistry, Australian National University, Canberra; ACT; 2601, Australia
  • [ 2 ] [Liu, Jianmei]State Key Laboratory of Advanced Materials and Electronic Components, Guangdong Fenghua Advanced Technology Holding Co. Ltd., Guangdong, Zhaoqing; 526020, China
  • [ 3 ] [Jacob, Lilit]School of Science, University of New South Wales (Canberra), Australian Defense Force Academy, Canberra; ACT; 2601, Australia
  • [ 4 ] [Langley, Julien]Research School of Chemistry, Australian National University, Canberra; ACT; 2601, Australia
  • [ 5 ] [Fu, Zhenxiao]State Key Laboratory of Advanced Materials and Electronic Components, Guangdong Fenghua Advanced Technology Holding Co. Ltd., Guangdong, Zhaoqing; 526020, China
  • [ 6 ] [Cao, Xiuhua]State Key Laboratory of Advanced Materials and Electronic Components, Guangdong Fenghua Advanced Technology Holding Co. Ltd., Guangdong, Zhaoqing; 526020, China
  • [ 7 ] [Ta, Shiwo]State Key Laboratory of Advanced Materials and Electronic Components, Guangdong Fenghua Advanced Technology Holding Co. Ltd., Guangdong, Zhaoqing; 526020, China
  • [ 8 ] [Chen, Hua]Research School of Chemistry, Australian National University, Canberra; ACT; 2601, Australia
  • [ 9 ] [Svirskas, ar Nas]Faculty of Physics, Vilnius University, Sauletekio al. 9, Vilnius; 10222, Lithuania
  • [ 10 ] [Banys, J Ras]Faculty of Physics, Vilnius University, Sauletekio al. 9, Vilnius; 10222, Lithuania
  • [ 11 ] [Wei, Xiaoyong]Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education and International Center for Dielectric Research, Xi'An Jiaotong University, Xi'an; 710049, China
  • [ 12 ] [Cox, Nicholas]Research School of Chemistry, Australian National University, Canberra; ACT; 2601, Australia
  • [ 13 ] [Frankcombe, Terry J.]School of Science, University of New South Wales (Canberra), Australian Defense Force Academy, Canberra; ACT; 2601, Australia
  • [ 14 ] [Liu, Yun]Research School of Chemistry, Australian National University, Canberra; ACT; 2601, Australia

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Source :

ACS Applied Electronic Materials

Year: 2021

Issue: 11

Volume: 3

Page: 5015-5022

3 . 3 1 4

JCR@2020

Cited Count:

WoS CC Cited Count: 1

SCOPUS Cited Count: 8

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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