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Abstract:
This letter reports the breakdown ruggedness of GaN-based quasi-vertical p-i-n diodes on Si for the first time. With a 2-mu m-thick drift layer, the 0.08-mm(2) devices can sustain a surge current up to 0.73 A, and maximum sink in energy of 3 mJ using an unclamped inductive switching test setup. No parametric drift nor device degradation was found after repetitive avalanche test consisting of multiple 50 000 breakdown events with a frequency of 1 kHz. At elevated temperatures, the breakdown voltage exhibits little temperature dependence, which could be explained by a trap-assisted space-charge-limited current conduction mechanism. With good ruggedness quality under repetitive test and at elevated temperatures, the quasivertical GaN p-i-n diodes on Si show great potential in achieving cost-effective rectifiers for high-voltage applications.
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IEEE ELECTRON DEVICE LETTERS
ISSN: 0741-3106
Year: 2016
Issue: 9
Volume: 37
Page: 1158-1161
3 . 0 4 8
JCR@2016
4 . 1 8 7
JCR@2020
ESI Discipline: ENGINEERING;
ESI HC Threshold:128
JCR Journal Grade:1
CAS Journal Grade:2
Cited Count:
WoS CC Cited Count: 23
SCOPUS Cited Count: 25
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 1
Affiliated Colleges: