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Author:

Zou, Xinbo (Zou, Xinbo.) | Zhang, Xu (Zhang, Xu.) | Lu, Xing (Lu, Xing.) | Tang, Chak Wah (Tang, Chak Wah.) | Lau, Kei May (Lau, Kei May.)

Indexed by:

SCIE EI Scopus

Abstract:

This letter reports the breakdown ruggedness of GaN-based quasi-vertical p-i-n diodes on Si for the first time. With a 2-mu m-thick drift layer, the 0.08-mm(2) devices can sustain a surge current up to 0.73 A, and maximum sink in energy of 3 mJ using an unclamped inductive switching test setup. No parametric drift nor device degradation was found after repetitive avalanche test consisting of multiple 50 000 breakdown events with a frequency of 1 kHz. At elevated temperatures, the breakdown voltage exhibits little temperature dependence, which could be explained by a trap-assisted space-charge-limited current conduction mechanism. With good ruggedness quality under repetitive test and at elevated temperatures, the quasivertical GaN p-i-n diodes on Si show great potential in achieving cost-effective rectifiers for high-voltage applications.

Keyword:

breakdown ruggedness GaN-on-Si p-i-n diodes rectifiers

Author Community:

  • [ 1 ] [Zou, Xinbo; Zhang, Xu; Tang, Chak Wah; Lau, Kei May] Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R China
  • [ 2 ] [Zou, Xinbo; Lau, Kei May] Hong Kong Univ Sci & Technol, HKUST Jockey Club Inst Adv Study, Hong Kong, Hong Kong, Peoples R China
  • [ 3 ] [Lu, Xing] Hong Kong Univ Sci & Technol, Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R China
  • [ 4 ] [Lu, Xing] Xi An Jiao Tong Univ, Sch Elect Engn, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
  • [ 5 ] [Zou, Xinbo]Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R China
  • [ 6 ] [Zhang, Xu]Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R China
  • [ 7 ] [Tang, Chak Wah]Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R China
  • [ 8 ] [Lau, Kei May]Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R China
  • [ 9 ] [Zou, Xinbo]Hong Kong Univ Sci & Technol, HKUST Jockey Club Inst Adv Study, Hong Kong, Hong Kong, Peoples R China
  • [ 10 ] [Lau, Kei May]Hong Kong Univ Sci & Technol, HKUST Jockey Club Inst Adv Study, Hong Kong, Hong Kong, Peoples R China
  • [ 11 ] [Lu, Xing]Hong Kong Univ Sci & Technol, Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R China
  • [ 12 ] [Lu, Xing]Xi An Jiao Tong Univ, Sch Elect Engn, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China

Reprint Author's Address:

  • Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R China.; Lau, KM (reprint author), Hong Kong Univ Sci & Technol, HKUST Jockey Club Inst Adv Study, Hong Kong, Hong Kong, Peoples R China.

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Source :

IEEE ELECTRON DEVICE LETTERS

ISSN: 0741-3106

Year: 2016

Issue: 9

Volume: 37

Page: 1158-1161

3 . 0 4 8

JCR@2016

4 . 1 8 7

JCR@2020

ESI Discipline: ENGINEERING;

ESI HC Threshold:128

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 23

SCOPUS Cited Count: 25

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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