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Author:

Xue, Jianyi (Xue, Jianyi.) | Wang, Han (Wang, Han.) | Chen, Junhong (Chen, Junhong.) | Li, Kefeng (Li, Kefeng.) | Liu, Yanqin (Liu, Yanqin.) | Song, Baipen (Song, Baipen.) | Deng, Junbo (Deng, Junbo.) | Zhang, Guanjun (Zhang, Guanjun.)

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SCIE EI Scopus

Abstract:

The accumulated charges on the insulator surface become a key factor to incur surface flashover. The charge accumulation process is closely related to the surface condition. This research investigates the effects of surface roughness on surface charge accumulation behavior and surface flashover performance of alumina-filled epoxy resin spacers in SF6/N-2 mixtures under DC voltage. The insulator is prepared with only half surface subjected to rough treatment. The accumulated charges are distributed in two regions. Considerable homo-charges are located near the high voltage (HV) electrode and few hetero-charges are near the grounded (GND) electrode (region I). These charges are injected by electrodes. The bipolar charges between HV and GND electrodes (region II) originate from gas ionization. Surface rough treatment can suppress surface charge accumulation and improve surface insulation strength. When increasing surface roughness, surface charge declines first slowly (stage I) and then rapidly (stage II), which coincides with the two stages of surface flashover voltage increment. Surface charge declination at stage I is mainly due to the increase in surface conductivity, while at stage II, the introduced deep traps also play a role. Surface flashover voltage increment at stage I is mainly due to the extended creepage distance, while at stage II, the declination of surface charge also plays a role. Besides, the block of electron avalanche development by the roughed surface is also responsible for the increase in surface flashover voltage at these two stages. Published by AIP Publishing.

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Author Community:

  • [ 1 ] [Xue, Jianyi; Wang, Han; Chen, Junhong; Song, Baipen; Deng, Junbo; Zhang, Guanjun] Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 2 ] [Li, Kefeng; Liu, Yanqin] Chengdu Power Supply Co, State Grid Sichuan Elect Power Co, Chengdu 010087, Sichuan, Peoples R China
  • [ 3 ] [Xue, Jianyi]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 4 ] [Wang, Han]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 5 ] [Chen, Junhong]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 6 ] [Song, Baipen]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 7 ] [Deng, Junbo]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 8 ] [Zhang, Guanjun]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 9 ] [Li, Kefeng]Chengdu Power Supply Co, State Grid Sichuan Elect Power Co, Chengdu 010087, Sichuan, Peoples R China
  • [ 10 ] [Liu, Yanqin]Chengdu Power Supply Co, State Grid Sichuan Elect Power Co, Chengdu 010087, Sichuan, Peoples R China

Reprint Author's Address:

  • Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China.

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Source :

JOURNAL OF APPLIED PHYSICS

ISSN: 0021-8979

Year: 2018

Issue: 8

Volume: 124

2 . 3 2 8

JCR@2018

2 . 5 4 6

JCR@2020

ESI Discipline: PHYSICS;

ESI HC Threshold:103

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 61

SCOPUS Cited Count: 95

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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