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Author:

You, Jianwei (You, Jianwei.) | Zhang, Jianfeng (Zhang, Jianfeng.) | Li, Yun (Li, Yun.) | Wang, Hongguang (Wang, Hongguang.)

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Abstract:

The material databases for the Vaughan's secondary electron model which is popularly utilized in the plasma simulation are abundant. Most of them are highly accurate and reliable, due to the validations of experiments. In order to integrate these precious databases into our electromagnetic-particle simulation platform and improve the computational precision of our simulation platform, the classic Vaughan's model for the secondary electron emission is firstly researched. Based on the derivation of the numerical method to generate the actual number of secondary electrons, the way to calculate the energy of each secondary electron and the method to obtain the emissive angle are successfully proposed. Due to our work, it is more convenient to numerically implement the Vaughan's theorem in practical applications. Furthermore, the accuracy and the robustness of our proposed methods are validated by the computational results in this paper.

Keyword:

Computational precision Computational results Electromagnetic-particle simulation Emissive angle Emissive energies Secondary electron emissions Secondary electrons Simulation platform

Author Community:

  • [ 1 ] [You, Jianwei;Zhang, Jianfeng]State Key Laboratory of Millimeter Waves, Southeast University, Nanjing 210096, China
  • [ 2 ] [Li, Yun]Key Laboratory of Science and Technology on Space Microwave Technology, Space Wireless Technology Institute, Xi'an 710100, China
  • [ 3 ] [Wang, Hongguang]Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, Xi'an 710049, China

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Source :

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams

ISSN: 1001-4322

Year: 2013

Issue: 11

Volume: 25

Page: 3035-3039

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 3

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count: -1

Chinese Cited Count: -1

30 Days PV: 16

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