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Author:

Xiong, Qing (Xiong, Qing.) | Ji, Shengchang (Ji, Shengchang.) | Liu, Xiaojun (Liu, Xiaojun.) | Li, Xining (Li, Xining.) | Zhu, Lingyu (Zhu, Lingyu.) | Feng, Xianyong (Feng, Xianyong.) | Gattozzi, Angelo L. (Gattozzi, Angelo L..) | Hebner, Robert E. (Hebner, Robert E..)

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Abstract:

A dc arc fault can be a serious threat to the safe operation of a low-voltage dc system. Typically, a fair amount of electromagnetic radiation (EMR) accompanies the arcing process. To investigate the characteristics of EMR of the series dc arc fault, a fourth-order Hilbert fractal antenna is used to detect the EMR signals generated by the dc arc. The factors influencing the characteristics of EMR including electrode material, diameter, current, and pressure are considered. The amplitudes of the EMR pulses at the arc initiation moment are measured, and fast Fourier transform is used to analyze the characteristics of the frequency spectrums. The test results indicate that the amplitudes of the EMR pulses generated by stainless steel electrodes are higher than those generated by brass, copper, and aluminum electrodes. Furthermore, the trends of the amplitudes of the EMR pulses with increasing current are different for electrodes with different diameters. Finally, it is observed that the influence of the pressure is different for different electrode materials. The characteristic frequency band of the EMR pulses of the dc arcs generated under various test conditions is in a certain range (36-41 MHz), which can be used as a detecting characteristic parameter for the series dc arc. IEEE

Keyword:

Aluminum electrodes Characteristic frequencies Electrode material Hilbert fractal antennas Low pressures Low-voltage DC systems series dc arc Stainless steel electrode

Author Community:

  • [ 1 ] [Xiong, Qing]State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, China, and also with the Center for Electromechanics, The University of Texas at Austin, Austin, TX 78758 USA.
  • [ 2 ] [Ji, Shengchang;Liu, Xiaojun;Li, Xining]State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, China.
  • [ 3 ] [Zhu, Lingyu]State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, China (e-mail: zhuly1026@xjtu.edu.cn).
  • [ 4 ] [Feng, Xianyong;Gattozzi, Angelo L.;Hebner, Robert E.]Center for Electromechanics, The University of Texas at Austin, Austin, TX 78758 USA.
  • [ 5 ] [Xiong, Qing; Ji, Shengchang; Liu, Xiaojun; Li, Xining; Zhu, Lingyu] Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 6 ] [Xiong, Qing; Feng, Xianyong; Gattozzi, Angelo L.; Hebner, Robert E.] Univ Texas Austin, Ctr Electromech, Austin, TX 78758 USA
  • [ 7 ] [Xiong, Qing]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 8 ] [Ji, Shengchang]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 9 ] [Liu, Xiaojun]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 10 ] [Li, Xining]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 11 ] [Zhu, Lingyu]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China
  • [ 12 ] [Xiong, Qing]Univ Texas Austin, Ctr Electromech, Austin, TX 78758 USA
  • [ 13 ] [Feng, Xianyong]Univ Texas Austin, Ctr Electromech, Austin, TX 78758 USA
  • [ 14 ] [Gattozzi, Angelo L.]Univ Texas Austin, Ctr Electromech, Austin, TX 78758 USA
  • [ 15 ] [Hebner, Robert E.]Univ Texas Austin, Ctr Electromech, Austin, TX 78758 USA

Reprint Author's Address:

  • Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Shaanxi, Peoples R China.

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Source :

IEEE Transactions on Plasma Science

ISSN: 0093-3813

Year: 2018

Issue: 11

Volume: 46

Page: 4028-4036

1 . 3 2 5

JCR@2018

1 . 2 2 2

JCR@2020

ESI Discipline: PHYSICS;

ESI HC Threshold:103

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 7

SCOPUS Cited Count: 19

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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