The　existence　of　a　compact　electron　blocking　layer　is　critical　in　organometal　halide　perovskite　solar　cell,　since　it　prevented　the　charge　recombination　originated　in　fluorine-doped　tin　oxide　(FTO)　electrode　and　the　hole　conducting　layer　and　ensured　an　effective　charge　abstract.　A　compact　TiO2　thin　film　was　fabricated　on　FTO　by　spin　coating　different　sols.　Commercial　peroxo　titanic　acid　(PTA)　aqueous　sol　and　titanium　isopropoxide　(TTIP)　sol　prepared　according　to　literature　were　used　to　regulate　the　performance　of　the　compact　layer.　With　the　optimized　blocking　layer　a　PCE　of　5.15%　was　archived　with　P3HT　as　hole-transport　material　(HTM)　and　magnetron　sputtering　Ag　as　counter　electrode.