Lithography,　the　fundamental　fabrication　process　of　semiconductor　devices,　has　been　playing　a　critical　role　in　micro-nanofabrication　technologies　and　manufacturing　of　Integrated　Circuits　(IC).　Traditional　optical　lithography　including　contact　and　project　photolithography　has　contributed　significantly　to　the　semiconductor　device　advancements.　Currently,　maintaining　the　rapid　pace　of　half-pitch　reduction　requires　overcoming　the　challenge　of　improving　and　extending　the　incumbent　optical　projection　lithography　technology　while　simultaneously　developing　alternative,　next　generation　lithography　(NGL)　technologies　to　be　used　when　optical　projection　lithography　is　no　longer　more　economical　than　the　alternatives.　Furthermore,　NIL　is　also　one　of　the　most　promising　low-cost,　high-throughput　technologies　for　manufacturing　nanostructures　as　this　highly　technical　book　will　give　new　insight　to.　©　2011　by　Nova　Science　Publishers,　Inc.　All　rights　reserved.