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Author:

Jin, Xiao-Wei (Jin, Xiao-Wei.) | Lu, Lu (Lu, Lu.) | Mi, Shao-Bo (Mi, Shao-Bo.) | Cheng, Sheng (Cheng, Sheng.) | Liu, Ming (Liu, Ming.) | Jia, Chun-Lin (Jia, Chun-Lin.)

Indexed by:

SCIE EI Scopus

Abstract:

Thin films of lead-free piezoelectric 0.95Na(0.5)Bi(0.5)TiO(3)-0.05BaTiO(3) (0.95NBTe0.05BT) are epitaxially grown on single crystalline SrTiO3 (001) substrates at 800 degrees C, 850 degrees C and 900 degrees C, respectively, by a highpressure sputtering deposition technique. The microstructure of the thin films is investigated by means of aberration-corrected scanning transmission electron microscopy. Planar defects are observed and the density of the defects increases with the increase of the film-growth temperature. Two types of planar defects in the films are studied at the atomic scale. One consists of groups of edge-sharing TiO6 octahedra with Bi atoms located between the TiO6 octahedral groups, and the other exists in the form of Na/Bi(Ba)-O-2-Na/Bi(Ba) layer parallel to the (010) plane of the films. Based on the structure feature of the planar defects, the propagation of the planar defects related to edge-sharing TiO6 octahedra within the films and from the film-substrate interface is discussed. Furthermore, the ordering of the planar defects is expected to form new structures. In comparison with the microstructure of 0.95NBT-0.05BT bulk materials, the appearance of the high-density planar defects observed within the films could be considered to be responsible for the difference in the physical properties between the bulk materials and the films. (C) 2016 Elsevier B.V. All rights reserved.

Keyword:

Piezoelectric materials Planar defects Thin films Transmission electron microscopy

Author Community:

  • [ 1 ] [Jin, Xiao-Wei; Lu, Lu; Cheng, Sheng; Liu, Ming; Jia, Chun-Lin] Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710049, Peoples R China
  • [ 2 ] [Mi, Shao-Bo] Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, Xian 710049, Peoples R China
  • [ 3 ] [Jia, Chun-Lin] Forschungszentrum Julich, Peter Grunberg Inst, D-52425 Julich, Germany
  • [ 4 ] [Jia, Chun-Lin] Forschungszentrum Julich, Ernst Ruska Ctr Microscopy & Spect Electrons, D-52425 Julich, Germany
  • [ 5 ] [Jin, Xiao-Wei]Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710049, Peoples R China
  • [ 6 ] [Lu, Lu]Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710049, Peoples R China
  • [ 7 ] [Cheng, Sheng]Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710049, Peoples R China
  • [ 8 ] [Liu, Ming]Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710049, Peoples R China
  • [ 9 ] [Jia, Chun-Lin]Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710049, Peoples R China
  • [ 10 ] [Mi, Shao-Bo]Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, Xian 710049, Peoples R China
  • [ 11 ] [Jia, Chun-Lin]Forschungszentrum Julich, Peter Grunberg Inst, D-52425 Julich, Germany
  • [ 12 ] [Jia, Chun-Lin]Forschungszentrum Julich, Ernst Ruska Ctr Microscopy & Spect Electrons, D-52425 Julich, Germany

Reprint Author's Address:

  • Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, Xian 710049, Peoples R China.

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Source :

JOURNAL OF ALLOYS AND COMPOUNDS

ISSN: 0925-8388

Year: 2016

Volume: 676

Page: 173-180

3 . 1 3 3

JCR@2016

5 . 3 1 6

JCR@2020

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:239

JCR Journal Grade:2

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 8

SCOPUS Cited Count: 9

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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