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Author:

Xiao, Huapan (Xiao, Huapan.) | Wang, Hairong (Wang, Hairong.) | Chen, Zhi (Chen, Zhi.) | Fu, Guanglong (Fu, Guanglong.) | Wang, Jiuhong (Wang, Jiuhong.)

Indexed by:

SCIE EI Scopus

Abstract:

Chemical etching experiments are carried out to expose and change the morphology of multiple scratches and single scratches in a set of K9 glasses, during which the transmission of some glasses is measured. The results show that brittle scratches have an influence on the transmission, and the transmission decreases at first and then increases obviously with the increase of etching time for the glass with a high density of cracks. The scattered field distribution around trailing indent crack(s) and the transmission of the glass with a scratch etched deeply (adjacent cracks have coalesced with each other) are simulated under different parameters. Using finite-difference time-domain (FDTD) algorithm, the light intensification effect around two single-evolving scratches and two adjacent cracks with different parameters are simulated, respectively. The results indicate that the position with the maximum light intensity changes for the glass with a scratch and its light intensity enhancement factors (LIEFs) will generally decrease as the etching process progresses. Compared with the morphology evolution of a scratch during the etching process, the changing mechanisms of transmission and LIEFs are revealed. This work will contribute to the improvement of service performance of optical glass by chemical etching process. (C) 2017 Society of Photo-Optical Instrumentation Engineers (SPIE)

Keyword:

brittle scratch chemical etching light intensification optical glass transmission

Author Community:

  • [ 1 ] [Xiao, Huapan; Wang, Hairong; Chen, Zhi; Fu, Guanglong; Wang, Jiuhong] Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian, Shaanxi, Peoples R China
  • [ 2 ] [Xiao, Huapan]Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian, Shaanxi, Peoples R China
  • [ 3 ] [Wang, Hairong]Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian, Shaanxi, Peoples R China
  • [ 4 ] [Chen, Zhi]Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian, Shaanxi, Peoples R China
  • [ 5 ] [Fu, Guanglong]Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian, Shaanxi, Peoples R China
  • [ 6 ] [Wang, Jiuhong]Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian, Shaanxi, Peoples R China

Reprint Author's Address:

  • Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian, Shaanxi, Peoples R China.

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Source :

OPTICAL ENGINEERING

ISSN: 0091-3286

Year: 2017

Issue: 10

Volume: 56

0 . 9 9 3

JCR@2017

1 . 0 8 4

JCR@2020

ESI Discipline: ENGINEERING;

ESI HC Threshold:121

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 10

SCOPUS Cited Count: 13

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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