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Author:

Xu Shenyue (Xu Shenyue.) | Zhao Hongyan (Zhao Hongyan.) | Zhu Xiaolong (Zhu Xiaolong.) | Guo Dalong (Guo Dalong.) | Feng Wentian (Feng Wentian.) | Lau Kai-Chung (Lau Kai-Chung.) | Ma Xinwen (Ma Xinwen.)

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Abstract:

We report the formation of H2+ and C2+ from dissociation of acetylene induced by α-particle irradiation. The unusual dissociation channel [C2H2]2+ → H2+ + C2+ is unambiguously identified by measuring the time-of-flight of both fragmented ions in coincidence. Our quantum chemical calculation confirms the existence of this dissociation pathway. It shows that [HCCH]2+ is firstly populated to the 3Π excited electronic state, followed by acetylene-vinylidene isomerization, and finally the vinylidene-like intermediate dissociates to H2+ and C2+. This dissociation channel is the simplest prototypical reaction involving H migration, H-H combination, and C-H bond cleavage. The current study plays an important role for understanding the H2+/H3+ formation reactions from organic di-cations in an interstellar medium.

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Author Community:

  • [ 1 ] [Zhu Xiaolong;Guo Dalong;Feng Wentian;Ma Xinwen]Institute of Modern Physics, Chinese Academy of Sciences, Nanchang Road 509, Lanzhou 730000, China. x.ma@impcas.ac.cn.
  • [ 2 ] [Zhao Hongyan;Lau Kai-Chung]Department of Chemistry, City University of Hong Kong, Tat Chee Avenue, Kowloon Tong, Hong Kong, China. kaichung@cityu.edu.hk.
  • [ 3 ] [Xu Shenyue]Institute of Modern Physics, Chinese Academy of Sciences, Nanchang Road 509, Lanzhou 730000, China. x.ma@impcas.ac.cn and School of Science, Xi'an Jiaotong University, Xianning West Road 28, Xi'an 710049, China. xushenyue@xjtu.edu.cn.

Reprint Author's Address:

  • Chinese Acad Sci, Inst Modern Phys, Nanchang Rd 509, Lanzhou 730000, Gansu, Peoples R China.; Xu, SY (reprint author), Xi An Jiao Tong Univ, Sch Sci, Xianning West Rd 28, Xian 710049, Shaanxi, Peoples R China.; Lau, KC (reprint author), City Univ Hong Kong, Dept Chem, Tat Chee Ave, Kowloon Tong, Hong Kong, Peoples R China.

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Physical chemistry chemical physics : PCCP

ISSN: 1463-9084

Year: 2018

Issue: 44

Volume: 20

Page: 27725-27729

Cited Count:

WoS CC Cited Count: 16

SCOPUS Cited Count: 7

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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