In　the　nanolithography,　some　exciting　developments　have　been　motivated　by　the　tapered　metal-coated　optical　fiber　probe　irradiated　by　ultra-fast　pulse　laser.　To　explore　the　related　mechanism,　the　local　field　is　studied　using　the　finite　element　method　in　this　paper.　The　simulation　results　show　the　reflection　at　the　cut-off　plane,　edge　enhancement　effect　and　surface　plasmon　resonance　become　the　major　factors　affecting　the　near-field.　In　addition,　Based　on　the　near-field　distribution　and　characteristics,　the　new　promising　scheme　is　proposed　for　near-field　nanolithography.