A　new　optical　near-field　nanolithography　scheme　with　optical　fiber　probe　laser　irradiating　atomic　force　microscopy　(AFM)　probe　tip　is　proposed.　Through　optical　theoretical　analysis,　if　the　metallic　AFM　probe　tip　is　in　the　evanescent　field　of　optical　fiber　probe　tip,　the　secondary　near-field　enhancement　effect　can　appear　underneath　the　metallic　AFM　probe　tip.　Based　on　the　independently　developed　AFM　system　and　optical　system,　the　nanolithography　platform　is　built　and　nanocraters　structures　can　be　successfully　created,　which　demonstrates　that　the　new　scheme　is　an　effective　and　promising　nanolithography　approach　for　the　future　nanoelectronics,　nanobiotechnology,　nanowelding,　etc.