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Author:

Park, Harold S. (Park, Harold S..) | Suo, Zhigang (Suo, Zhigang.) | Zhou, Jinxiong (Zhou, Jinxiong.) | Klein, Patrick A. (Klein, Patrick A..)

Indexed by:

SCIE EI Scopus

Abstract:

We present a three-dimensional nonlinear finite element formulation for dielectric elastomers. The mechanical and electrical governing equations are solved monolithically using an implicit time integrator, where the governing finite element equations are given for both static and dynamic cases. By accounting for inertial terms in conjunction with the Arruda-Boyce rubber hyperelastic constitutive model, we demonstrate the ability to capture the various modes of inhomogeneous deformation, including pull-in instability and wrinkling, that may result in dielectric elastomers that are subject to various forms of electrostatic loading. The formulation presented here forms the basis for needed computational tools that can elucidate the electromechanical behavior and properties of dielectric elastomers that are used for engineering applications. (C) 2012 Elsevier Ltd. All rights reserved.

Keyword:

Dielectric elastomer Electromechanical instability Finite element Snap through Wrinkling

Author Community:

  • [ 1 ] [Park, Harold S.] Boston Univ, Dept Mech Engn, Boston, MA 02215 USA
  • [ 2 ] [Suo, Zhigang] Harvard Univ, Kavli Inst Nanobio Sci & Technol, Sch Engn & Appl Sci, Cambridge, MA 02138 USA
  • [ 3 ] [Zhou, Jinxiong] Xi An Jiao Tong Univ, Sch Aerosp, Xian 710049, Peoples R China
  • [ 4 ] [Zhou, Jinxiong] Xi An Jiao Tong Univ, MOE Key Lab Strength & Vibrat, Xian 710049, Peoples R China
  • [ 5 ] [Klein, Patrick A.] Franklin Templeton Investments, San Mateo, CA 94403 USA

Reprint Author's Address:

  • Boston Univ, Dept Mech Engn, Boston, MA 02215 USA.

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Source :

INTERNATIONAL JOURNAL OF SOLIDS AND STRUCTURES

ISSN: 0020-7683

Year: 2012

Issue: 15-16

Volume: 49

Page: 2187-2194

1 . 8 7 1

JCR@2012

3 . 9 0 0

JCR@2020

ESI Discipline: ENGINEERING;

ESI HC Threshold:157

JCR Journal Grade:2

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 76

SCOPUS Cited Count: 90

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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