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Author:

Huang, Yu-Cheng (Huang, Yu-Cheng.) | Thanigai Arul, K. (Thanigai Arul, K..) | Chen, Chi-Liang (Chen, Chi-Liang.) | Chen, Jeng-Lung (Chen, Jeng-Lung.) | Chen, Jie (Chen, Jie.) | Shen, Shaohua (Shen, Shaohua.) | Lu, Ying-Ru (Lu, Ying-Ru.) | Kuo, Chun-Hong (Kuo, Chun-Hong.) | Dong, Chung-Li (Dong, Chung-Li.) | Chou, Wu-Ching (Chou, Wu-Ching.)

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SCIE EI CPCI-S Scopus Download Full text

Abstract:

Graphitic carbon nitride (g-C3N4) has attracted considerable attention with regard to its use in photocatalytic solar hydrogen production by the splitting of water. High charge carrier recombination critically limits the photocatalytic activity of g-C3N4. Plasmonic metal nanoparticles that can generate localized surface plasmon resonance (LSPR) have been suggested to enhance the harvesting of visible light and to improve water splitting efficiency. However, direct contact between metal nanoparticles and g-C3N4 reduces the hydrogen generation efficiency owing to energy loss by Förster resonance energy transfer (FRET), which competes with plasmon resonance energy transfer (PRET). Decorating g-C3N4 with Ag@SiO2 core-shell plasmonic nanoparticles increases its photocatalytic ability. Tuning the size of the SiO2 nanogap can optimize the photocatalytic performance of g-C3N4/Ag@SiO2, which involves a trade-off between PRET and FRET. X-ray absorption spectroscopy (XAS) is utilized to investigate the electronic structure of g-C3N4 and its modulation with Ag@SiO2. In situ XAS reveals the dynamics of the charge carriers under solar illumination. Analytic results suggest charge redistribution, shifting of the conduction band, modification of the unoccupied states, and consequent improvement in photocatalytic activity by solar illumination. This work sheds light on the effect of LSPR on this photocatalyst with reference to its electronic structure. © 2020 Elsevier B.V.

Keyword:

Charge carriers Economic and social effects Electronic structure Energy dissipation Forster resonance energy transfer Graphitic Carbon Nitride Hydrogen production Light Metal nanoparticles Photocatalytic activity Plasmonic nanoparticles Plasmons Resonance Silica Silicon SiO2 nanoparticles Solar power generation Surface plasmon resonance X ray absorption spectroscopy

Author Community:

  • [ 1 ] [Huang, Yu-Cheng]Department of Electrophysics, National Chiao Tung University, Hsinchu; 30010, Taiwan; Research Center for X-ray Science & Department of Physics, Tamkang University, Tamsui; 25137, Taiwan
  • [ 2 ] [Thanigai Arul, K.]Research Center for X-ray Science & Department of Physics, Tamkang University, Tamsui; 25137, Taiwan
  • [ 3 ] [Chen, Chi-Liang]National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, Hsinchu; 30076, Taiwan
  • [ 4 ] [Chen, Jeng-Lung]National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, Hsinchu; 30076, Taiwan
  • [ 5 ] [Chen, Jie]International Research Center for Renewable Energy State Key Laboratory of Multiphase Flow in Power Engineering, Xi'an Jiaotong University, Xi'an; Shaanxi; 710049, China
  • [ 6 ] [Shen, Shaohua]International Research Center for Renewable Energy State Key Laboratory of Multiphase Flow in Power Engineering, Xi'an Jiaotong University, Xi'an; Shaanxi; 710049, China
  • [ 7 ] [Lu, Ying-Ru]National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, Hsinchu; 30076, Taiwan
  • [ 8 ] [Kuo, Chun-Hong]Institute of Chemistry, Academia Sinica, Taipei; 11529, Taiwan
  • [ 9 ] [Dong, Chung-Li]Research Center for X-ray Science & Department of Physics, Tamkang University, Tamsui; 25137, Taiwan
  • [ 10 ] [Chou, Wu-Ching]Department of Electrophysics, National Chiao Tung University, Hsinchu; 30010, Taiwan

Reprint Author's Address:

  • [Chou, Wu-Ching]Natl Chiao Tung Univ, Dept Electrophys, Hsinchu 30010, Taiwan;;[Dong, Chung-Li]Tamkang Univ, Res Ctr Xray Sci, Tamsui 25137, Taiwan;;[Dong, Chung-Li]Tamkang Univ, Dept Phys, Tamsui 25137, Taiwan;;

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Source :

Applied Surface Science

ISSN: 0169-4332

Year: 2020

Volume: 514

6 . 7 0 7

JCR@2020

6 . 7 0 7

JCR@2020

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:84

JCR Journal Grade:2

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 4

SCOPUS Cited Count: 10

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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