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Author:

Deng, Jie (Deng, Jie.) | Wang, Lijun (Wang, Lijun.) | Zhang, Xiao (Zhang, Xiao.) | Yang, Ze (Yang, Ze.) | Jia, Shenli (Jia, Shenli.)

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Abstract:

This paper involves the simulation of vacuum arc under composite contact. A three dimensional model is developed and we consider the ionization process in the vacuum arc. The species transport equations, in which the fraction of each species is calculated, provides the distribution of various atoms and ions in vacuum arc. The model describes ions and atoms as two different processes considering that ions are influenced by self-generated magnetic field. Atoms play an inferior role in the vacuum arc plasma process. They gather in an 'atom layer' whose thickness is a tenth of contact gap. Furthermore, the distribution of ion species is closely related to the degree of ionization. At cathode, singly charged ions are dominant. From cathode to anode, ions are ionized so that doubly particles become a major component at anode. Finally, atom calculation enables the accomplishment to combine atom with ion behavior together. Distributions of species are available by species transport equations, providing the fraction of species. © 2018 IEEE.

Keyword:

Anodes Atoms Binary alloys Cathodes Chromium alloys Copper alloys Ionization Ions Population distribution Vacuum applications Vacuum technology

Author Community:

  • [ 1 ] [Deng, Jie]State Key Laboratory of Electrical Insulation and Power Equipment, Xi'An Jiaotong University, Xi'an, China
  • [ 2 ] [Wang, Lijun]State Key Laboratory of Electrical Insulation and Power Equipment, Xi'An Jiaotong University, Xi'an, China
  • [ 3 ] [Zhang, Xiao]State Key Laboratory of Electrical Insulation and Power Equipment, Xi'An Jiaotong University, Xi'an, China
  • [ 4 ] [Yang, Ze]State Key Laboratory of Electrical Insulation and Power Equipment, Xi'An Jiaotong University, Xi'an, China
  • [ 5 ] [Jia, Shenli]State Key Laboratory of Electrical Insulation and Power Equipment, Xi'An Jiaotong University, Xi'an, China

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ISSN: 1093-2941

Year: 2018

Volume: 2

Page: 431-434

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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