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Author:

Hasija, Vasudha (Hasija, Vasudha.) | Nguyen, Van-Huy (Nguyen, Van-Huy.) | Kumar, Ajay (Kumar, Ajay.) | Raizada, Pankaj (Raizada, Pankaj.) | Krishnan, Venkata (Krishnan, Venkata.) | Khan, Aftab Aslam Parwaz (Khan, Aftab Aslam Parwaz.) | Singh, Pardeep (Singh, Pardeep.) | Lichtfouse, Eric (Lichtfouse, Eric.) | Wang, Chuanyi (Wang, Chuanyi.) | Thi Huong, Pham (Thi Huong, Pham.)

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Abstract:

Photocatalytic materials for photocatalysis is recently proposed as a promising strategy to address environmental remediation. Metal-free graphitic carbon nitride (g-C3N4), is an emerging photocatalyst in sulfate radical based advanced oxidation processes. The solar-driven electronic excitations in g-C3N4 are capable of peroxo (OO) bond dissociation in peroxymonosulfate/peroxydisulfate (PMS/PDS) and oxidants to generate reactive free radicals, namely SO4•− and OH• in addition to O2•− radical. The synergistic mechanism of g-C3N4 mediated PMS/PDS photocatalytic activation, could ensure the generation of OH• radicals to overcome the low reductive potential of g-C3N4 and fastens the degradation reaction rate. This article reviews recent work on heterojunction formation (type-II heterojunction and direct Z-scheme) to achieve the bandgap for extended visible light absorption and improved charge carrier separation for efficient photocatalytic efficiency. Focus is placed on the fundamental mechanistic routes followed for PMS/PDS photocatalytic activation over g-C3N4-based photocatalysts. A particular emphasis is given to the factors influencing the PMS/PDS photocatalytic activation mechanism and the contribution of SO4•− and OH• radicals that are not thoroughly investigated and require further studies. Concluding perspectives on the challenges and opportunities to design highly efficient persulfate-activated g-C3N4 based photocatalysts toward environmental remediation are also intensively highlighted. © 2021 Elsevier B.V.

Keyword:

Carbon nitride Chemical activation Free radicals Heterojunctions Light absorption Photocatalytic activity Pollution Sulfur compounds

Author Community:

  • [ 1 ] [Hasija, Vasudha]School of Advanced Chemical Sciences, Shoolini University, Solan; Himachal Pradesh; 173229, India
  • [ 2 ] [Nguyen, Van-Huy]Key Laboratory of Advanced Materials for Energy and Environmental Applications, Lac Hong University, Dong Nai; 810000, Viet Nam
  • [ 3 ] [Kumar, Ajay]School of Basic Sciences and Advanced Materials Research Center, Indian Institute of Technology Mandi, Kamand, Mandi; Himachal Pradesh; 175075, India
  • [ 4 ] [Raizada, Pankaj]School of Advanced Chemical Sciences, Shoolini University, Solan; Himachal Pradesh; 173229, India
  • [ 5 ] [Krishnan, Venkata]School of Basic Sciences and Advanced Materials Research Center, Indian Institute of Technology Mandi, Kamand, Mandi; Himachal Pradesh; 175075, India
  • [ 6 ] [Khan, Aftab Aslam Parwaz]Center of Excellence for Advanced Materials Research, King Abdulaziz University, P.O.Box 80203, Jeddah; 21589, Saudi Arabia
  • [ 7 ] [Khan, Aftab Aslam Parwaz]Chemistry Department, Faculty of Science, King Abdulaziz University, P.O.Box 80203, Jeddah, Saudi Arabia
  • [ 8 ] [Singh, Pardeep]School of Advanced Chemical Sciences, Shoolini University, Solan; Himachal Pradesh; 173229, India
  • [ 9 ] [Lichtfouse, Eric]Aix-Marseille Univ, CNRS, IRD, INRA, Coll France, CEREGE, Aix-en-Provence; 13100, France
  • [ 10 ] [Lichtfouse, Eric]International Research Centre for Renewable Energy, State Key Laboratory of Multiphase Flow in Power Engineering, Xi'an Jiaotong University, Xi'an, China
  • [ 11 ] [Wang, Chuanyi]School of Environmental Science and Engineering, Shaanxi University of Science and Technology, Xi'an; 710021, China
  • [ 12 ] [Thi Huong, Pham]Institute of Research and Development, Duy Tan University, Da Nang; 550000, Viet Nam
  • [ 13 ] [Thi Huong, Pham]Faculty of Environment and Chemical Engineering, Duy Tan University, Da Nang; 550000, Viet Nam

Reprint Author's Address:

  • [Singh, Pardeep]School of Advanced Chemical Sciences, Shoolini University, Solan; Himachal Pradesh; 173229, India;;

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Source :

Journal of Hazardous Materials

ISSN: 0304-3894

Year: 2021

Volume: 413

1 0 . 5 8 8

JCR@2020

ESI Discipline: ENGINEERING;

ESI HC Threshold:30

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 56

SCOPUS Cited Count: 333

ESI Highly Cited Papers on the List: 6 Unfold All

  • 2022-11
  • 2022-9
  • 2022-7
  • 2022-5
  • 2022-3
  • 2022-1

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

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