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Author:

Li, Xiangmeng (Li, Xiangmeng.) | Yan, Xin (Yan, Xin.) | Zhao, Zepeng (Zhao, Zepeng.) | Mohamed, Mazin Salah (Mohamed, Mazin Salah.) | Wang, Jianqing (Wang, Jianqing.) | Zhu, Xijing (Zhu, Xijing.)

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Abstract:

Moth-eye inspired nanostructure is widely used in optical applications. In this numerical study, a new type of anti-reflection film is designed using finite difference time domain method (FDTD). A three-dimensional model is established, simulating a monolayer of close-packed silica nanoparticle film embedded in a layer of polymeric optical adhesive. FDTD simulation is carried out in the visible band of wavelength, in order to investigate the transmittance of light propagation through the silica nanoparticle and adhesive layer. The effect of size of nanostructure as well as the embedding degree of optical adhesive are compared on different substrates, including visible transparent substrates with lower refractive index, i.e., fused silica glass, PMMA, PS, and visible opaque silicon substrate, with high refractive index. The numerical results reveal that we can obtain the best optical performance with nanoparticle size of 200 nm in diameter, while the immersion degree has different effects on different substrates. © 2021 Elsevier GmbH

Keyword:

Adhesives Embeddings Finite difference time domain method Fused silica Numerical methods Optical films Refractive index Silica nanoparticles Substrates Thin films

Author Community:

  • [ 1 ] [Li, Xiangmeng]Shanxi Key Laboratory of Advanced Manufacturing Technology, North University of China, Taiyuan; 030051, China
  • [ 2 ] [Li, Xiangmeng]State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an; 710049, China
  • [ 3 ] [Yan, Xin]Shanxi Key Laboratory of Advanced Manufacturing Technology, North University of China, Taiyuan; 030051, China
  • [ 4 ] [Zhao, Zepeng]Shanxi Key Laboratory of Advanced Manufacturing Technology, North University of China, Taiyuan; 030051, China
  • [ 5 ] [Mohamed, Mazin Salah]Shanxi Key Laboratory of Advanced Manufacturing Technology, North University of China, Taiyuan; 030051, China
  • [ 6 ] [Wang, Jianqing]Shanxi Key Laboratory of Advanced Manufacturing Technology, North University of China, Taiyuan; 030051, China
  • [ 7 ] [Zhu, Xijing]Shanxi Key Laboratory of Advanced Manufacturing Technology, North University of China, Taiyuan; 030051, China

Reprint Author's Address:

  • [Li, Xiangmeng]Shanxi Key Laboratory of Advanced Manufacturing Technology, North University of China, Taiyuan; 030051, China;;[Li, Xiangmeng]State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an; 710049, China;;

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Source :

Optik

ISSN: 0030-4026

Year: 2021

Volume: 241

2 . 4 4 3

JCR@2020

ESI Discipline: PHYSICS;

ESI HC Threshold:26

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 1

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 11

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