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Author:

Sun, Liqiong (Sun, Liqiong.) | Wang, Zhenxing (Wang, Zhenxing.) | Cao, Zhiyuan (Cao, Zhiyuan.) | Cao, Bo (Cao, Bo.) | Geng, Yingsan (Geng, Yingsan.) | Wang, Jianhua (Wang, Jianhua.)

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EI SCIE Scopus Engineering Village

Abstract:

It is well-known that when high currents flow through a vacuum gap, anode spots are formed on the anode surface. However, anode flare phenomena are also observed in low-current vacuum discharges. The objective of this article is to experimentally observe the spatial distribution of excited Cu atoms and ions generated from a single cathode spot (CS) and to interpret the mechanism of the anode flare at low currents (40-80 A). Optical emission spectroscopy (OES) and laser-induced fluorescence (LIF) techniques have been used for investigating low-current vacuum arc discharge confined to axial magnetic fields (AMFs). The effects of AMFs and arc currents on the axial distribution of the radiation intensity were investigated for different copper ionization states (Cu I and Cu II). The highest luminance was found near the electrodes for both excited neutral copper atoms and ions, and only weak spectral lines of excited Ni atoms were detected in the near-anode region. With increasing the external AMF, a bright 'spot' appeared near the anode surface. In the visible light range, excited atoms were the main contributor to anode flare in low-current vacuum discharge. As measured by LIF, the density of copper atoms near the anode increased from 10 × 1017 to 14 × 1017, m-3 when the applied magnetic fields increased from 31 to 74 mT. The anode flare contains far more excited atoms from the cathode material than the anode material. They are the results of cathodic plasma expansion to reach the anode after charge neutralization and reflection on the anode surface. For the single CS, the observed fact that a tiny number of atoms leave the anode surface and participate in the anode flare is more likely the result of a sputtering effect rather than thermal evaporation by cathode electron stream. © 1973-2012 IEEE.

Keyword:

Anodes Atoms Cathodes Copper compounds Electric discharges Magnetic fields Metal ions Radiation effects Surface waves Vacuum applications Vacuum technology

Author Community:

  • [ 1 ] [Sun, Liqiong]Xi'An Jiaotong University, State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an; 710049, China
  • [ 2 ] [Wang, Zhenxing]Xi'An Jiaotong University, State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an; 710049, China
  • [ 3 ] [Cao, Zhiyuan]Xi'An Jiaotong University, State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an; 710049, China
  • [ 4 ] [Cao, Bo]Xi'An Jiaotong University, State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an; 710049, China
  • [ 5 ] [Geng, Yingsan]Xi'An Jiaotong University, State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an; 710049, China
  • [ 6 ] [Wang, Jianhua]Xi'An Jiaotong University, State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an; 710049, China
  • [ 7 ] [Sun, Liqiong]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
  • [ 8 ] [Wang, Zhenxing]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
  • [ 9 ] [Cao, Zhiyuan]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
  • [ 10 ] [Cao, Bo]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
  • [ 11 ] [Geng, Yingsan]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
  • [ 12 ] [Wang, Jianhua]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China

Reprint Author's Address:

  • [Wang, Z.]Xi'An Jiaotong University, China;;

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Source :

IEEE Transactions on Plasma Science

ISSN: 0093-3813

Year: 2022

Issue: 7

Volume: 50

Page: 2156-2165

1 . 2 2 2

JCR@2020

ESI Discipline: PHYSICS;

ESI HC Threshold:6

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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