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Author:

Fu, Yuwei (Fu, Yuwei.) | Luo, Santu (Luo, Santu.) | Li, Xingdi (Li, Xingdi.) | Chen, Chi (Chen, Chi.) | Wang, Chuang (Wang, Chuang.) | Zhang, Zaiqin (Zhang, Zaiqin.) | Liu, Dingxin (Liu, Dingxin.) (Scholars:刘定新)

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SCIE Scopus Web of Science

Abstract:

C5F10O-insulated environmental-friendly power equipment has great potential to be used in the near future to reduce greenhouse effect. During maintenance, C5F10O should be supplemented or replaced, and the released gas is promisingly to be removed by advanced oxidation processes, but chemical kinetics of C5F10O with the most reactive and dominant species center dot OH radical in air plasma is still not clear. Therefore, this paper studied the degradation pathways and rate constants of C5F10O + center dot OH in both gaseous and aqueous phases with M06-2X/6-31G* method and transition state theory. A continuum solvation model was also employed to study the influence of solvent on chemical kinetics of C5F10O + center dot OH. The results show that most reactions (except for R7 and R8) in both phases have a similar transition state vibration mode leading to same products but rate constants are different. The rate constants of reactions R5 and S5 are highest in corresponding states, respectively, playing a dominant role in the degradation of C5F10O + center dot OH, but the rate constant of reaction S5 is much lower indicating that AOP treatment for C5F10O in gas phase is more effective. This work lays a theoretical basis for plasma modeling and experimental investigation for C5F10O degradation by advanced oxidation process.

Keyword:

6-31G* C5F10O Chemical kinetics Degradation pathways M06-2X

Author Community:

  • [ 1 ] [Fu, Yuwei]Xian Univ Technol, Sch Elect Engn, Xian 710048, Peoples R China
  • [ 2 ] [Li, Xingdi]Xian Univ Technol, Sch Elect Engn, Xian 710048, Peoples R China
  • [ 3 ] [Chen, Chi]Xian Univ Technol, Sch Elect Engn, Xian 710048, Peoples R China
  • [ 4 ] [Wang, Chuang]Xian Univ Technol, Sch Elect Engn, Xian 710048, Peoples R China
  • [ 5 ] [Zhang, Zaiqin]Xian Univ Technol, Sch Elect Engn, Xian 710048, Peoples R China
  • [ 6 ] [Luo, Santu]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Ctr Plasma Biomed, Xian 710049, Peoples R China
  • [ 7 ] [Liu, Dingxin]Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, Ctr Plasma Biomed, Xian 710049, Peoples R China

Reprint Author's Address:

  • [Fu, Y.]School of Electrical Engineering, China;;[Fu, Y.]State Key Laboratory of Electrical Insulation and Power Equipment, China;;

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Source :

PLASMA CHEMISTRY AND PLASMA PROCESSING

ISSN: 0272-4324

Year: 2022

Issue: 6

Volume: 42

Page: 1265-1278

3 . 1 4 8

JCR@2020

ESI Discipline: CHEMISTRY;

ESI HC Threshold:6

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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