By　using　800-nm　femtosecond　laser　irradiation　and　chemical　selective　etching　with　hydrofluoric　acid,　microchannels　are　fabricated　in　silicon　carbide.　The　diameter　of　the　microchannel　is　about　1.5　mu　m.　The　morphology　of　the　channel　is　characterized　by　using　scanning　electronic　microscopy　equipped　with　an　energy　dispersive　X-ray　spectroscopy.　The　formation　mechanism　of　silicon　carbide　channels　is　attributed　to　the　formation　of　laser-induced　structural　change　zones　in　silicon　carbide　and　the　reaction　of　the　laser-induced　structural　change　zones　with　hydrofluoric　acid.　In　addition,　the　influences　of　the　laser　average　power　and　scanning　velocity　on　the　position　of　the　microchannel　are　discussed.　(C)　2015　Laser　Institute　of　America.