• Complex
  • Title
  • Author
  • Keyword
  • Abstract
  • Scholars
Search

Author:

Zhang, Xiaohua (Zhang, Xiaohua.) | Ren, Wei (Ren, Wei.) (Scholars:任巍) | Shi, Peng (Shi, Peng.) | Wu, Xiaoqing (Wu, Xiaoqing.) | Chen, Xiaofeng (Chen, Xiaofeng.) | Yao, Xi (Yao, Xi.)

Indexed by:

SCIE EI Scopus

Abstract:

Pyrochlore Bi1.5Zn1.0Nb1.5O7 (BZN) thin films deposited at 650 degrees C under an oxygen pressure of 10 Pa by pulsed laser deposition were characterized as a function of zinc amount. The zinc concentration in the thin films was varied using ceramic targets having 0-40 mol% excess zinc contents. The X-ray diffraction measurement shows that thin films have a cubic pyrochlore phase structure and a strong preferential orientation of (111) plane. The dielectric properties are investigated as functions of temperature and frequency. Dielectric constant and loss tangent of the thin films both slightly increase with the increase of Zn amount. The thin film with 40 mol% zinc exhibits a dielectric constant of 198 and a loss tangent of 0.004 at 10 kHz. The dielectric relaxation behavior has been studied by measuring the temperature dependence of dielectric properties. The characteristic temperatures (T-m) move to the high temperature with the increase of Zn and gradually approach that of BZN ceramic. Meanwhile, in a wide frequency and temperature range (1 kHz-1 MHz, -100-150 degrees C), the dielectric constant of the thin films almost keeps unchanged and shows a negative temperature coefficient. Leakage current density of the thin films with 20 mol% zinc is approximately three order magnitude lower than that of films with 0 mol% zinc at 400 kV/cm. The conduction of BZN thin films is controlled by the Schottky emission mechanism and the space-charge-limited current mechanism. (C) 2012 Elsevier B. V. All rights reserved.

Keyword:

Dielectric properties Pulsed laser deposition Pyrochlore Bi1.5Zn1.0Nb1.5O7 thin film Zinc compensation

Author Community:

  • [ 1 ] [Zhang, Xiaohua] Xi An Jiao Tong Univ, Elect Mat Res Lab, Key Lab, Minist Educ, Xian 710049, Peoples R China
  • [ 2 ] [Zhang, Xiaohua] Xi An Jiao Tong Univ, Int Ctr Dielect Res, Xian 710049, Peoples R China

Reprint Author's Address:

  • Xi An Jiao Tong Univ, Elect Mat Res Lab, Key Lab, Minist Educ, Xian 710049, Peoples R China.

Show more details

Related Keywords:

Source :

JOURNAL OF ALLOYS AND COMPOUNDS

ISSN: 0925-8388

Year: 2013

Volume: 553

Page: 8-13

2 . 7 2 6

JCR@2013

5 . 3 1 6

JCR@2020

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:292

JCR Journal Grade:2

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 17

SCOPUS Cited Count: 19

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

FAQ| About| Online/Total:300/168352506
Address:XI'AN JIAOTONG UNIVERSITY LIBRARY(No.28, Xianning West Road, Xi'an, Shaanxi Post Code:710049) Contact Us:029-82667865
Copyright:XI'AN JIAOTONG UNIVERSITY LIBRARY Technical Support:Beijing Aegean Software Co., Ltd.